Patent Number: 7,084,977

Title: Exposure apparatus and method of measuring Mueller Matrix of optical system of exposure apparatus

Abstract: A method is provided for measuring Mueller Matrix of an optical system of an exposure apparatus. Light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based on Mueller matrix of each optical system. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.

Inventors: Nomura; Hiroshi (Kawasaki, JP)

Assignee: Kabushiki Kaisha Toshiba

International Classification: G01J 4/00 (20060101)

Expiration Date: 8/01/02018