Patent Number: 7,086,031

Title: Methods of forming patterned reticles

Abstract: The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.

Inventors: Dulman; H. Daniel (Boise, ID), Stanton; William A. (Boise, ID), Futrell; John R. C. (Boise, ID)

Assignee: Micron Technology, Inc.

International Classification: G06F 17/50 (20060101); G03F 9/00 (20060101)

Expiration Date: 8/01/02018