Patent Number: 7,088,030

Title: High-aspect-ratio-microstructure (HARM)

Abstract: A high-aspect-ratio-microstructure (HARM) is provided. The structure includes: a substrate; a lower structure with a comb shape fixedly mounted on said substrate and having first plural comb fingers, wherein each of the first plural comb fingers has a thin slot thereon; an upper structure with a comb shape having second plural comb fingers, wherein the lower structure and the upper structure have a height difference therebetween so as to form an uneven surface; and a lateral strengthening structure formed at vertically peripheral walls of the first plural comb fingers and the second plural comb fingers for protecting the plural first and second comb fingers.

Inventors: Hsieh; Jerwei (Sanchong, TW), Chu; Huai-Yuan (Shulin, TW), Tsai; Julius Ming-Lin (Taipei, TW), Fang; Weileun (Hsinchu, TW)

Assignee: Walsin Lihwa Corporation

International Classification: H02N 1/00 (20060101); G02B 26/08 (20060101)

Expiration Date: 8/08/02018