Patent Number: 7,101,260

Title: Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants

Abstract: A method for manufacturing an article where the article has polymeric residue that is to be removed during the manufacture of the article. The article is introduced into a controlled environment of a processing tool that has at least first and second processing chambers. Free radicals are generated from one or more reactant gases and introduced into at least the first processing chamber where they react with the polymeric residue. A cryogenic cleaning medium is supplied into the second processing chamber where it removes the polymeric residue present after the free radicals react with the polymeric residue. The reactant gases are selected to facilitate removal of the polymeric residue with the cryogenic cleaning medium The first and second processing chambers may be dedicated to plasma processing or cryogenic processing or each may provide both plasma processing and cryogenic processing.

Inventors: Tannous; Adel George (Santa Clara, CA), Makhamreh; Khalid (Los Gatos, CA)

Assignee: Nanoclean Technologies, Inc.

International Classification: C25F 3/30 (20060101)

Expiration Date: 9/05/02018