Patent Number: 7,101,816

Title: Methods for adaptive real time control of a thermal processing system

Abstract: Methods for adaptive real time control of a system for thermal processing substrates, such as semiconductor wafers and display panels. Generally, the method includes creating a dynamic model of the thermal processing system, incorporating wafer bow in the dynamic model, coupling a diffusion-amplification model into the dynamic thermal model, creating a multivariable controller, parameterizing the nominal setpoints, creating a process sensitivity matrix, creating intelligent setpoints using an efficient optimization method and process data, and establishing recipes that select appropriate models and setpoints during run-time.

Inventors: Kaushal; Sanjeev (Austin, TX), Sugishima; Kenji (Tokyo, JP), Pandey; Pradeep (San Jose, CA)

Assignee: Tokyo Electron Limited

International Classification: G06F 19/00 (20060101)

Expiration Date: 9/05/02018