Patent Number: 7,102,165

Title: Semiconductor device and manufacturing method thereof

Abstract: A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.

Inventors: Yamazaki; Shunpei (Setagaya, JP)

Assignee: Semiconductor Energy Laboratory Co., Ltd.

International Classification: H01L 29/10 (20060101); H01L 31/06 (20060101); H01L 31/0376 (20060101); H01L 31/20 (20060101)

Expiration Date: 9/05/02018