Patent Number: 7,103,482

Title: Inspection system and apparatus

Abstract: A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.

Inventors: Steele; M. Brandon (Decatur, GA), Hawthorne; Jeffrey Alan (Decatur, GA), Kim; Chunho (Duluth, GA), Sowell; David C. (Atlanta, GA)

Assignee: Qcept Technologies, Inc.

International Classification: G01B 5/28 (20060101); B08B 6/00 (20060101); H01L 21/00 (20060101)

Expiration Date: 9/05/02018