Patent Number: 7,131,999

Title: Lithographic apparatus and device manufacturing method

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

Inventors: Hoogkamp; Jan Frederik (Breda, NL), Kuit; Jan Jaap (Veldhoven, NL), Visser; Raimond (Best, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/58 (20060101)

Expiration Date: 2019-11-07 0:00:00