Patent Number: 7,132,219

Title: Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 .mu.m or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

Inventors: Sabnis; Ram W. (Evansville, IN), Shih; Wu-Sheng (Rolla, MO), Guerrero; Douglas J. (Rolla, MO)

Assignee: Brewer Science Inc.

International Classification: G03C 5/00 (20060101); B05D 3/02 (20060101); G03F 7/11 (20060101); H01L 21/31 (20060101); H01L 21/469 (20060101)

Expiration Date: 2019-11-07 0:00:00