Patent Number: 7,132,225

Title: Methods of inspecting a lithography template

Abstract: A method for forming imprint lithography templates is described herein. The method includes forming a masking layer and a conductive layer on a substrate surface. The use of a conductive layer allows patterning of the masking layer using electron beam pattern generators. The substrate is etched using the patterned masking layer to produce a template.

Inventors: Voisin; Ronald D. (Austin, TX)

Assignee: Molecular Imprints, Inc.

International Classification: H01L 21/00 (20060101)

Expiration Date: 2019-11-07 0:00:00