Patent Number: 7,132,669

Title: Method and equipment for detecting pattern defect

Abstract: An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.

Inventors: Shishido; Hiroaki (Yokohama, JP), Yoshitake; Yasuhiro (Yokosuka, JP), Nakata; Toshihiko (Hiratsuka, JP), Maeda; Shunji (Yokohama, JP), Yoshida; Minoru (Yokohama, JP), Uto; Sachio (Yokohama, JP)

Assignee: Hitachi, Ltd.

International Classification: G01N 21/00 (20060101)

Expiration Date: 2019-11-07 0:00:00