Patent Number: 7,133,120

Title: Lithographic apparatus, article support member, and method

Abstract: A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

Inventors: Zaal; Koen Jacobus Johannes Maria (Eindhoven, NL), Van Meer; Aschwin Lodewijk Hendricus Johannes (Roosendaal, NL), Ottens; Joost Jeroen (Veldhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/62 (20060101); G03B 27/58 (20060101)

Expiration Date: 2019-11-07 0:00:00