Patent Number: 7,133,493

Title: X-ray irradiation apparatus

Abstract: An X-ray irradiation apparatus includes an enclosure and an X-ray beam system positioned within the enclosure for directing X-ray beams into an irradiation region. The X-ray beam system has more than one X-ray beam emitter for directing the X-ray beams into the irradiation region from different directions. Each X-ray beam emitter includes a vacuum chamber having a target window and an electron generator positioned within the vacuum chamber for generating electrons that are directed at the target window for forming X-rays which pass through the target window as an X-ray beam. The target window is supported by a support plate having a series of holes therethrough which allow passage of the electrons therethrough to reach the target window.

Inventors: Avnery; Tzvi (Winchester, MA)

Assignee: Advanced Electron Beams, Inc.

International Classification: G21K 5/00 (20060101); H01J 35/08 (20060101); H01J 35/18 (20060101)

Expiration Date: 2019-11-07 0:00:00