Patent Number: 7,201,642

Title: Process for producing improved membranes

Abstract: The present invention relates generally to the field of chemical/mechanical polishing of substrates. In particular the invention relates to methods of producing improved membranes for use in chemical/mechanical polishing systems. The present invention provides a method of improving the properties of a flexible membrane for use in chemical/mechanical polishing, the method including subjecting the membrane to elevated temperatures.

Inventors: Koh; Meng Fei (Singapore, SG), Poh; Choon Siong (Singapore, SG), Goh; Inn Swee (Singapore, SG), Leong; Theng Wei (Singapore, SG), Neo; Teck Leong (Singapore, SG), Wang; Bing (Singapore, SG)

Assignee: Systems on Silicon Manufacturing Co. Pte. Ltd.

International Classification: B24B 1/00 (20060101)

Expiration Date: 2019-04-10 0:00:00