Patent Number: 7,202,014

Title: Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition

Abstract: A stimulus-sensitive composition comprising a compound (A) that generates one of an acid and a radical by external stimulation, the compound (A) having a specific structure.

Inventors: Kodama; Kunihiko (Shizuoka, JP)

Assignee: Fujifilm Corporation

International Classification: G03C 1/73 (20060101); C07C 381/12 (20060101); G03F 7/038 (20060101); G03F 7/039 (20060101); G03F 7/20 (20060101); G03F 7/30 (20060101)

Expiration Date: 2019-04-10 0:00:00