Patent Number: 7,202,172

Title: Microelectronic device having disposable spacer

Abstract: A method of manufacturing a microelectronic device comprising forming a patterned feature over a substrate and employing a fluorine-containing plasma source to deposit a conformal polymer layer over the patterned feature and the substrate. The polymer layer is etched to expose the patterned feature and a portion of the substrate, thereby forming polymer spacers on opposing sides of the patterned feature.

Inventors: Chan; Bor-Wen (Hsin-Chu, TW), Wang; Yu-I (Hsin-Chu, TW), Tao; Han-Jan (Hsin-Chu, TW)

Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.

International Classification: H01L 21/311 (20060101)

Expiration Date: 2019-04-10 0:00:00