Patent Number: 7,271,950

Title: Apparatus and method for optimizing a pellicle for off-axis transmission of light

Abstract: An apparatus and method for optimizing a pellicle for off-axis transmission are disclosed. A pellicle includes a thin film optimized for transmission of off-axis incident light at a desired angle. The pellicle further includes an optical thickness greater than a design thickness by less than or equal to approximately one-quarter of an exposure wavelength.

Inventors: Gordon; Joseph S (Gardiner, NY), Hughes; Gregory P (Austin, TX), Kalk; Franklin D (Austin, TX), Alpay; Hakki U (Poughquag, NY)

Assignee: Toppan Photomasks, Inc.

International Classification: G02B 5/28 (20060101); G03F 1/00 (20060101)

Expiration Date: 2019-09-18 0:00:00