Patent Number: 7,303,980

Title: Laser annealing method and apparatus

Abstract: A linear pulse laser beam to be applied to an illumination surface is so formed as to have, at the focus, an energy profile in the width direction which satisfies inequalities 0.5L1.ltoreq.L2.ltoreq.L1 and 0.5L1.ltoreq.L3.ltoreq.L1 where assuming that a maximum energy is 1, L1 is a beam width of two points having an energy of 0.95 and L1+L2+L3 is a beam width of two points having an energy of 0.70, L2 and L3 occupying two peripheral portions of the beam width. According to another aspect of the invention, a compound-eye-like fly-eye lens for expanding a pulse laser beam in a sectional manner is provided upstream of a cylindrical lens for converging the laser beam into a linear beam.

Inventors: Yamazaki; Shunpei (Tokyo, JP), Kusumoto; Naoto (Kanagawa, JP), Tanaka; Koichiro (Kanagawa, JP)

Assignee: Semiconductor Energy Laboratory Co., Ltd.

International Classification: H01L 21/00 (20060101)

Expiration Date: 2020-12-04 0:00:00