Patent Number: 7,355,677

Title: System and method for an improved illumination system in a lithographic apparatus

Abstract: An array of individually controllable elements for use in lithography in which each of the individually controllable elements is comprised of a planar reflector mounted on supports on a substrate by way of elongate hinges.

Inventors: Bijvoet; Dirk-Jan (Eindhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/54 (20060101)

Expiration Date: 2020-04-08 0:00:00