Patent Number: 7,356,114

Title: X-ray fluorescence spectrometer

Abstract: An X-ray fluorescence spectrometer includes an X-ray source 7 for irradiating a sample 1 at a predetermined incident angle o with primary X-rays 6, and a detecting device 9 for measuring an intensity of fluorescent X-rays 8 generated from the sample at a predetermined detection angle .alpha. and .beta., wherein with two combinations of the incident angle o and the detection angle .alpha. and .beta., in which combinations the incident angles o and/or the detection angles .alpha. and .beta. are different from each other, each intensity of the fluorescent X-rays 8 is measured and, also, the incident angle o and the detection angle .alpha. and .beta. in each of the combination are so set that with respect to a measurement depth represented by the coating weight, at which the intensity of the fluorescent X-rays 8 attains a value equal to 99% of the uppermost limit when the coating weight of a target coating to be measured is increased, respective measurement depths in the two combinations may be a value greater than the coating weight of a coating 3.

Inventors: Kataoka; Yoshiyuki (Takatsuki, JP), Furusawa; Eiichi (Takatsuki, JP), Kohno; Hisayuki (Takatsuki, JP)

Assignee: Rigaku Industrial Corporation

International Classification: G01N 23/223 (20060101)

Expiration Date: 2020-04-08 0:00:00