Patent Number: 7,421,974

Title: Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus

Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm.sup.2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.

Inventors: Fukuda; Kazuhiro (Tokyo, JP), Kondo; Yoshikazu (Tokyo, JP), Murakami; Takashi (Tokyo, JP), Iwamaru; Shunichi (Tokyo, JP), Muramatsu; Yumi (Tokyo, JP), Tsuji; Toshio (Tokyo, JP)

Assignee: Konica Corporation

International Classification: C23C 16/00 (20060101)

Expiration Date: 2020-09-09 0:00:00