Patent Number: 7,535,550

Title: Exposure apparatus, exposure method, and method for producing device

Abstract: An exposure method exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate by using a projection optical system. The exposure method includes supplying the liquid onto a part of the substrate including a projection area of the projection optical system to form a liquid immersion area, the liquid having an affinity for a liquid contact surface disposed at an end of the projection optical system, the affinity being higher than an affinity for a surface of the substrate, and projecting the image of the predetermined pattern onto the substrate through the liquid supplied to the liquid immersion area.

Inventors: Nagasaka; Hiroyuki (Kumagaya, JP)

Assignee: Nikon Corporation

International Classification: G03B 27/42 (20060101); G03B 27/32 (20060101)

Expiration Date: 2021-05-19 0:00:00