Patent Number: 7,611,631

Title: Indium adsorbent and indium fractioning method

Abstract: The invention provides an indium adsorbent that can cause indium to be adsorbed, and a simple and inexpensive indium fractioning method for isolating and recovering high-purity indium from an acid solution whose primary component is hydrochloric acid and that contains indium. A primary component of the indium adsorbent is an anion-exchange resin that has a crosslinked structure produced by the copolymerization of styrene or acrylamide and divinylbenzene, and at least one of a quaternary ammonium group and a tertiary ammonium group, and that is provided with an acid-adsorbing ability. An acid solution whose primary component is hydrochloric acid and that includes indium is brought into contact with the anion-exchange resin to cause indium to be adsorbed to the anion-exchange resin.

Inventors: Ohnishi; Akifusai (Osaka, JP), Fujiwara; Nobuaki (Osaka, JP), Doi; Hideki (Osaka, JP), Matsunami; Toyokazu (Osaka, JP), Tsubota; Hiroshi (Osaka, JP), Muratani; Toshiaki (Osaka, JP), Nishikawa; Shoji (Osaka, JP), Yamasaki; Shinichi (Osaka, JP), Honma; Takamichi (Osaka, JP)

Assignee: Aquatech Corporation

International Classification: C02F 1/42 (20060101); B01D 15/08 (20060101); C02F 1/28 (20060101); C01G 15/00 (20060101); C08F 12/28 (20060101)

Expiration Date: 1/03/02017