Patent Number: 7,611,828

Title: Photoactive adhesion promoter

Abstract: An adhesion promoter to help reduce semiconductor process effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer. A photoactive adhesion promoter (PAG) is described which helps reduce these and other undesired effects associated with the removal of photoresist in a semiconductor manufacturing process.

Inventors: Meagley; Robert P. (Hillsboro, OR)

Assignee:

International Classification: G03F 7/00 (20060101); C07F 7/02 (20060101); G03F 7/004 (20060101)

Expiration Date: 1/03/02017