Patent Number: 7,611,971

Title: Method of removing residual contaminants from an environment

Abstract: A method of reducing the amount of halogenated materials in a halogen-containing environment. The method comprises introducing an aluminum compound into the halogen-containing environment, reacting the aluminum compound with the halogenated material to form a gaseous reaction product, and removing the gaseous reaction product from the environment. The aluminum compound may be a trialkylaluminum compound, an alane, an alkylaluminum hydride, an alkylaluminum halide, an alkylaluminum sesquihalide, or an aluminum sesquihalide. The aluminum compound may alternatively form a solid aluminum product, which is deposited on a surface associated with the halogen-containing environment or onto a semiconductor disposed therewithin. The halogenated material is incorporated into the solid aluminum product, forming an inert film within which the halogenated material is trapped.

Inventors: Sarigiannis; Demetrius (Boise, ID), Basceri; Cem (Boise, ID), Hill; Christopher W. (Boise, ID), Derderian; Garo J. (Boise, ID)

Assignee: Micron Technology, Inc.

International Classification: H01L 21/00 (20060101)

Expiration Date: 1/03/02017