Patent Number: 7,612,349

Title: Surface plasmon enhanced fluorescence sensor

Abstract: Exciting light is irradiated through a dielectric material block toward an interface between the dielectric material block and a metal film formed on one surface of the dielectric material block, such that total reflection conditions may be satisfied. An intensity of analysis fluorescence produced by an analysis fluorescent substance, which is contained in a sample and produces the analysis fluorescence by being excited by an evanescent wave oozing out from the interface when the exciting light impinges upon the interface, is normalized in accordance with an intensity of reference fluorescence produced by a reference fluorescent substance, which has been located at a position for excitation by the exciting light.

Inventors: Kimura; Toshihito (Ashigarakami-gun, JP)

Assignee: FUJIFILM Corporation

International Classification: G01N 21/64 (20060101)

Expiration Date: 1/03/02017