Patent Number: 7,612,353

Title: Lithographic apparatus, contaminant trap, and device manufacturing method

Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Inventors: Sjmaenok; Leonid Aizikovitch (Vaals, NL), Banine; Vadim Yevgenyevich (Helmond, NL), Smits; Josephus Jacobus (Geldrop, NL), Van Den Wildenberg; Lambertus Adrianus (Geldrop, NL), Schmidt; Alexander Alexandrovitch (St. Petersburg, RU), Wassink; Arnoud Cornelis (Veldhoven, NL), Verpalen; Eric Louis Willem (Geldrop, NL), Van De Pas; Antonius Johannes (Veldhoven, NL), Brom; Paul Peter Anna Antonius (Eindhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: A61N 5/06 (20060101); G01J 3/10 (20060101); H05G 2/00 (20060101)

Expiration Date: 1/03/02017