Patent Number: 7,612,865

Title: Pattern writing apparatus and pattern writing method

Abstract: Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.

Inventors: Hisaoka; Katsuyuki (Kyoto, JP), Shirota; Hiroyuki (Kyoto, JP)

Assignee: Dainippon Screen Mfg. Co., Ltd.

International Classification: G03B 27/54 (20060101); B41J 15/14 (20060101); G03F 1/00 (20060101); B41J 2/47 (20060101); G03B 27/32 (20060101)

Expiration Date: 1/03/02017