Patent Number: 7,612,868

Title: Exposure apparatus and method of manufacturing device

Abstract: An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.

Inventors: Tsuchiya; Go (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03B 27/72 (20060101); G03B 27/42 (20060101)

Expiration Date: 1/03/02017