Patent Number: 7,708,868

Title: Variable thickness plate for forming variable wall thickness physical vapor deposition target

Abstract: A variable thickness sputtering target which increases the target material thickness at strategic locations to greatly improve the yield of usable wafers per target, and a method of manufacturing such target comprising forming a generally flat and circularly shaped target blank so that a thickness dimension between the top and bottom surfaces decreases as a function of radius of the target blank. The variable thickness target blank is then formed into a variable thickness dome shaped target member having a bottom portion and a sidewall portion, wherein a wall thickness of said variable thickness dome-shaped target member is thickest proximate a center portion of said bottom portion. In one embodiment of the invention, the variable thickness target blank is formed by clock rolling (or compression rolling) the target blank with crowned rolls to obtain a variable thickness target blank.

Inventors: Smathers; David B. (Columbus, OH), Holcomb; Melvin K. (Grove City, OH), Land; Eric (Columbus, OH)

Assignee: Tosoh SMD, Inc.

International Classification: B23K 20/00 (20060101); B21D 22/16 (20060101); C23C 14/32 (20060101)

Expiration Date: 5/04/12018