Patent Number: 7,709,062

Title: Refilling method by ion beam, instrument for fabrication and observation by ion beam, and manufacturing method of electronic device

Abstract: A hole in a sample from which a sample piece has been extracted with a focused ion beam is filled at high speed using ion beam gas assisted deposition. A method of filling the hole by using the ion beam includes a step of irradiating the hole formed in a face of the sample with the ion beam to thereby form an ion beam gas-assisted deposition layer in the hole. The ion beam gas-assisted deposition layer is formed in the hole while controlling the area to which the ion beam is irradiated so as to cause the ion beam to fall on a part of a side wall of the hole and to not fall on another part of the side wall in an area scanned with the ion beam. The filled hole may then be covered with a protective film.

Inventors: Shichi; Hiroyasu (Tokyo, JP), Fukuda; Muneyuki (Kokubunji, JP), Sekihara; Isamu (Fussa, JP), Tomimatsu; Satoshi (Kokubunji, JP), Umemura; Kaoru (Musashino, JP)

Assignee: Hitachi High-Technologies Corporation

International Classification: C23C 14/46 (20060101); B05D 5/00 (20060101); C23C 16/48 (20060101); B05D 1/26 (20060101)

Expiration Date: 5/04/12018