Patent Number: 7,709,815

Title: Lithography system and projection method

Abstract: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

Inventors: Jager; Remco (PG Utrecht, NL), Kastelijn; Aukje Arianne Annette (BJ Eindhoven, NL), de Boer; Guido (GP Someren, NL), Wieland; Marco Jan Jaco (GD Delft, NL), Steenbrink; Stijn Willem Karel Herman (AM Utrecht, NL)

Assignee: Mapper Lithography IP B.V.

International Classification: G21K 5/04 (20060101); G21K 1/00 (20060101)

Expiration Date: 5/04/12018