Patent Number: 7,710,543

Title: Scanning exposure apparatus and device manufacturing method

Abstract: A measurement apparatus includes a measurement unit configured to execute first measurement at each of a plurality of measurement points on a substrate, which are juxtaposed in one of a direction perpendicular to a scanning direction and an oblique direction with respect to the scanning direction, and to execute a second measurement at each of the plurality of measurement points, while the substrate is shifted in a direction different from the scanning direction and a processing unit configured to select some measurement points from the plurality of measurement points on the basis of a change in a measurement value at each measurement point, which is obtained by the first measurement and the second measurement.

Inventors: Oishi; Satoru (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03B 27/52 (20060101); G03B 27/32 (20060101); G03B 27/42 (20060101); G03B 27/58 (20060101)

Expiration Date: 5/04/12018