Patent Number: 7,713,684

Title: System and method for absorbance modulation lithography

Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.

Inventors: Menon; Rajesh (Cambridge, MA), Smith; Henry I. (Sudbury, MA)

Assignee: Massachusetts Institute of Technology

International Classification: G03F 1/00 (20060101)

Expiration Date: 5/11/12018