Patent Number: 7,714,032

Title: Thiol compound and photosensitive composition using the same

Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R.sup.1, R.sup.2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude. ##STR00001##

Inventors: Kamata; Hirotoshi (Kanagawa, JP), Onishi; Mina (Kanagawa, JP), Murofushi; Katsumi (Kanagawa, JP)

Assignee: Showa Denko K.K.

International Classification: A61L 27/34 (20060101); C08G 59/42 (20060101)

Expiration Date: 5/11/12018