Patent Number: 7,714,308

Title: Variable shaped electron beam lithography system and method for manufacturing substrate

Abstract: This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern using the single electron beam formed by passing the beam through the first, second and third aperture in sequence. Each of the first, second and third aperture has a mechanism for rotationally driving the aperture around an optical axis up to an arbitrary angle from 0 to 360.degree.. Further, in the third aperture, a mechanism for varying the opening slit width of the rectangular opening portion is provided.

Inventors: Hiroshima; Masahito (Tokyo, JP)

Assignee: Elpida Memory, Inc.

International Classification: H01J 37/30 (20060101); G21K 5/00 (20060101); H01J 37/08 (20060101)

Expiration Date: 5/11/12018