Patent Number: 7,731,800

Title: Systems and methods for single integrated substrate cleaning and rinsing

Abstract: Inventive methods and systems of cleaning patterned integrated circuit ("IC") substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.

Inventors: Puri; Suraj (Los Altos, CA)

Assignee: Nano OM, LLC

International Classification: B08B 7/00 (20060101)

Expiration Date: 2022-06-08 0:00:00