Patent Number: 7,732,110

Title: Method for exposing a substrate and lithographic projection apparatus

Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.

Inventors: Finders; Jozef Maria (Veldhoven, NL), Stoeldraijer; Judocus Marie Dominicus (Bladel, NL), De Klerk; Johannes Wilhelmus (Eindhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03F 9/00 (20060101); G03B 27/52 (20060101); G03B 27/58 (20060101)

Expiration Date: 2022-06-08 0:00:00