Patent Number: 7,733,459

Title: Lithographic apparatus and device manufacturing method

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Inventors: Dierichs; Marcel Mathijs Theodore Marie (Venlo, NL), Donders; Sjoerd Nicolaas Lambertus ('S-Hertogenbosch, NL), Jacobs; Johannes Henricus Wilhelmus (Eindhoven, NL), Jansen; Hans (Eindhoven, NL), Loopstra; Erik Roelof (Heeze, NL), Mertens; Jeroen Johannes Sophia Maria (Duizel, NL), Stavenga; Marco Koert (Eindhoven, NL), Streefkerk; Bob (Tilburg, NL), Verhagen; Martinus Cornelis Maria (Valkenswaard, NL), Seuntiens-Gruda; Lejla (Eindhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/52 (20060101); G03B 27/42 (20060101)

Expiration Date: 2022-06-08 0:00:00