Patent Number: 7,765,076

Title: Allocating processing units to processing clusters to generate simulated diffraction signals

Abstract: In allocating processing units, first and second requests for jobs are obtained. First and second numbers of processing units requested are determined. First and second numbers of available processing units are determined. When the first number of available processing units is non-zero, the first number of available number of processing units or the first number of processing units requested is assigned to a first processing cluster. A first processing unit in the first processing cluster is designated as a master node. When the second number of available processing units is non-zero, the second number of available number of processing units or the second number of processing units requested is assigned to a second processing cluster. The first processing unit in the second processing cluster is designated as a slave node. The first and second jobs are assigned to the first and second processing clusters, respectively.

Inventors: Erva; Hemalatha (Fremont, CA), Qiu; Hong (Union City, CA), Bao; Junwei (Palo Alto, CA), Vuong; Vi (Fremont, CA)

Assignee: Tokyo Electron Limited

International Classification: G01N 37/00 (20060101)

Expiration Date: 7/27/12018