Patent Number: 7,765,234

Title: Data flow management in generating different signal formats used in optical metrology

Abstract: To manage data flow in generating different signal formats for use in optical metrology, a project data object is created. A first option data object is created. The first option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. A version number is associated with the first option data object. The first option data object is linked with the project data object. At least a second option data object is created. The second option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. The set of signal parameters of the first option data object and the set of signal parameters of the second option data object are set differently. Another version number is associated with the second option data object. The second option data object is linked with the project data object. The project data object, the first option data object, and the second option data object are stored. The version numbers associated with the first option data object and the second option data object are stored. The link between the first option data object and the project data object is stored. The link between the second option data object and the project data object is stored.

Inventors: Qiu; Hong (Union City, CA), Bao; Junwei (Palo Alto, CA), Liu; Wei (Santa Clara, CA), Chard; Jeffrey Alexander (Sunnyvale, CA), Liu; Miao (Mountain View, CA), He; Gang (Sunnyvale, CA), Erva; Hemalatha (Fremont, CA), Vuong; Vi (Fremont, CA)

Assignee: Tokyo Electron Limited

International Classification: G06Q 50/00 (20060101)

Expiration Date: 7/27/12018