Patent Number: 7,785,714

Title: Extreme low resistivity light attenuation anti-reflection coating structure and method for manufacturing the same

Abstract: An extreme low resistivity light attenuation anti-reflection coating structure with a surface protective layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of silicon carbide compound coating layers and a plurality of metal coating layers that are alternately stacked with each other. The composed protection coating layer is formed on the coating module.

Inventors: Chang; Cheng-Chieh (Hsinchu, TW), Liu; Shiu-Feng (Hsinchu, TW), Kuo; Pi-Jui (Hsinchu, TW)

Assignee: Innovation & Infinity Global Corp.

International Classification: B32B 7/00 (20060101); B32B 15/00 (20060101)

Expiration Date: 8/31/12018