Patent Number: 7,819,979

Title: Method and system for cleaning magnetic artifacts using a carbonyl reactive ion etch

Abstract: A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.

Inventors: Chen; Benjamin (San Jose, CA), Li; Yun-Fei (Fremont, CA), Hiner; Hugh C. (Fremont, CA), Zhang; Wei (Fremont, CA), Chen; Yingjian (Fremont, CA)

Assignee: Western Digital (Fremont), LLC

International Classification: B08B 7/00 (20060101); B08B 7/04 (20060101)

Expiration Date: 2018-10-26 0:00:00