Patent Number: 7,820,017

Title: Dielectric-layer-coated substrate and installation for production thereof

Abstract: The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam (3) coming from an ion source (4), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.

Inventors: Baubet; Carole (Aachen, DE), Fischer; Klaus (Alsdorf, DE), Loergen; Marcus (Herzogenrath, DE), Giron; Jean Christophe (Aachen, DE), Nadaud; Nicolas (Gentilly, FR), Mattman; Eric (Paris, FR), Rousseau; Jean Paul (Boulogne, FR), Hofrichter; Alfred (Aachen, DE), Jansen; Manfred (Geilenkirchen, DE)

Assignee: Saint-Gobain Glass France

International Classification: C23C 14/34 (20060101)

Expiration Date: 2018-10-26 0:00:00