Patent Number: 7,820,231

Title: Manufacturing apparatus

Abstract: The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superior uniformity in EL layer film thickness, superior throughput, and improved utilization efficiency of EL materials and an evaporation method. The present invention is characterized in that an evaporation source holder, in which a container that encloses an evaporation material is disposed, is moved at a certain pitch with respect to a substrate during evaporation. Further, a film thickness monitor is integrated with the evaporation source holder for the movement. Furthermore, film thickness can be made uniform by adjusting the moving speed of the evaporation source holder in accordance with values measured by the film thickness monitor.

Inventors: Yamazaki; Shunpei (Tokyo, JP), Murakami; Masakazu (Kanagawa, JP)

Assignee: Semiconductor Energy Laboratory Co., Ltd.

International Classification: B05D 5/06 (20060101); C23C 16/00 (20060101)

Expiration Date: 2018-10-26 0:00:00