Patent Number: 7,820,556

Title: Method for purifying acetylene gas for use in semiconductor processes

Abstract: Acetylene is treated to remove some residual storage solvent that may be present with the acetylene in a source of acetylene such as a container. Such treatment may be performed prior to supplying the acetylene to a deposition chamber or other reactor where acetylene is a reactant. After treatment, the acetylene gas stream has a relatively constant concentration of storage solvent, regardless of how much acetylene has been released from the acetylene source. The treatment may involve condensing the storage solvent from the gas stream at a certain temperature and separating the storage solvent from the gas stream.

Inventors: Hsu; Gishun (Santa Clara, CA), Merrill; Charles (Portland, OR), Stoddard; Scott (Sherwood, OR)

Assignee: Novellus Systems, Inc.

International Classification: H01L 21/02 (20060101)

Expiration Date: 2018-10-26 0:00:00