Patent Number: 7,821,617

Title: Exposure apparatus and device manufacturing method

Abstract: An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.

Inventors: Hara; Hiromichi (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G03B 27/42 (20060101); G03B 27/54 (20060101); G03B 27/58 (20060101); G03B 27/32 (20060101)

Expiration Date: 2018-10-26 0:00:00