Patent Number: 7,821,648

Title: Measurement method, a measurement apparatus, and a computer-readable recording medium

Abstract: A measurement method for measuring a shape of a target using an interference pattern includes the steps of converting a first interference pattern into a first shape of the target (S103 to S105), obtaining a second interference pattern at a position where the target moves in an optical axis direction of the reference surface (S107, S108), unwrapping the second interference pattern after aligning a phase of the first interference pattern with a phase of the second interference pattern (S109), converting the unwrapped second interference pattern into a second shape of the target (S110), determining whether or not the first shape of the target coincides with the second shape (S111), and calculating the shape of the target by adding the integral multiple of a wavelength of the light source to the unwrapped second interference pattern if the first shape does not coincide with the second shape (S112).

Inventors: Yamazoe; Kenji (Berkeley, CA), Oshima; Yuki (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G01B 11/02 (20060101)

Expiration Date: 2018-10-26 0:00:00