Patent Number: 7,824,535

Title: Microstructure and method of manufacturing the same

Abstract: A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.

Inventors: Hatanaka; Yusuke (Shizuoka, JP), Tomita; Tadabumi (Shizuoka, JP), Hotta; Yoshinori (Aichi, JP), Uesugi; Akio (Shizuoka, JP)

Assignee: FUJIFILM Corporation

International Classification: C25D 11/06 (20060101); B32B 3/26 (20060101)

Expiration Date: 2019-11-02 0:00:00