Patent Number: 7,824,845

Title: Functionalized carbosilane polymers and photoresist compositions containing the same

Abstract: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 .mu.m.sup.-1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

Inventors: Allen; Robert D. (San Jose, CA), Colburn; Matthew E. (Schenectady, NY), Sanders; Daniel P. (San Jose, CA), Sooriyakumaran; Ratnam (San Jose, CA), Truong; Hoa D. (San Jose, CA)

Assignee: International Business Machines Corporation

International Classification: G03F 7/038 (20060101); G03F 7/039 (20060101); G03F 7/30 (20060101); G03F 7/20 (20060101)

Expiration Date: 2019-11-02 0:00:00